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Tatsuya Tomita
General Manager/Photomask Engineering at Dai Nippon Printing Co. Ltd.
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Publications (3)
Proceedings Article | 10 April 2024 Poster
Exploring the potential of EB lithography in EUV photomask manufacturing
Mei Ebisawa, Tsukasa Abe, Yukihiro Fujimura, Izumi Hotei, Masataka Yamaji, Yasutaka Morikawa, Tatsuya Tomita, Naoya Hayashi, Shingo Yoshikawa
Proceedings Volume PC12953, PC1295313 (2024) https://doi.org/10.1117/12.3013224
KEYWORDS: Extreme ultraviolet, Lithography, Photoresist processing, Photomasks, Manufacturing, High volume manufacturing, Extreme ultraviolet lithography, Semiconductors, Logic, Semiconductor manufacturing
Proceedings Article | 22 November 2023 Presentation
Ultimate resolution challenge for high-precision EUV mask by using MBMW technology
Shingo Yoshikawa, Tsukasa Abe, Yukihiro Fujimura, Mei Ebisawa, Izumi Hotei, Issei Sakai, Masataka Yamaji, Yasutaka Morikawa, Tatsuya Tomita, Koji Ichimura, Naoya Hayashi
Proceedings Volume PC12751, PC127510U (2023) https://doi.org/10.1117/12.2688952
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconductor manufacturing, Photomasks, Photomask technology, Manufacturing, Lithography, Electron beams
Proceedings Article | 14 October 2011 Paper
Effects of cleaning on NIL templates: surface roughness, CD, and pattern integrity
Proceedings Volume 8166, 81662P (2011) https://doi.org/10.1117/12.898649
KEYWORDS: Nanoimprint lithography, Particles, Surface roughness, Critical dimension metrology, Quartz, Photoresist processing, Binary data, Chromium, Silica, Inspection
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