We developed a new concept of organic-inorganic hybrid multi-layer EUV PR with a vertical molecular wire structure. Organic-inorganic hybrid multi-layers are deposited by sequential deposition of organic and inorganic molecules. And each organic and inorganic layer has a specific function. Each inorganic layer can have special functions such as high EUV absorbance, high electron reactivity, and etch resistance, and the components and composition of each layer can be freely changed to achieve high EUV sensitivity and excellent plasma etching resistance. In addition, by introducing organic molecules between inorganic molecules, horizontal cross-linking is limited, making it possible to grow a thin film with a vertical molecular wire structure with a spacing between molecular wires of 1 nm or less. And thereby an exceptionally low LER can be generated.
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