Sangmin Lee
at Hanyang Univ
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 April 2024 Poster
Jaehyuk Lee, Hyeonseok Ji, Sangmin Lee, Myung Mo Sung
Proceedings Volume 12957, 129571V (2024) https://doi.org/10.1117/12.3010671
KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Line width roughness, Extreme ultraviolet, Photoresist developing, Semiconductors, Semiconductor manufacturing, Molecules, Field effect transistors, Thin film deposition

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