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Ryusei Yanoshita
at Ushio Inc
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Publications (1)
Proceedings Article | 9 April 2024 Poster + Paper
Fabrication process of flexibly patterned grating by interference lithography system with automated beam alignment module
K. Toyoda, Y. Nawaki, R. Yanoshita, S. Orihara, M. Wasamoto, K. Ota, K. Tsuruoka
Proceedings Volume 12956, 129560Q (2024) https://doi.org/10.1117/12.3010691
KEYWORDS: Lithography, Diffraction gratings, Optical gratings, Holography, Semiconducting wafers, Optical alignment, Fabrication, Beam path, Automatic alignment, Image processing
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