CONFERENCE PROCEEDINGS
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Ryu Komatsu
at KIOXIA Corp.
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 23 August 2021 Paper
Self-aligned double patterning process for sub-15nm nanoimprint template fabrication
Yoshinori Kagawa, Machiko Suenaga, Hikaru Sasaki, Koji Murano, Shunko Magoshi, Ryu Komatsu, Kosuke Takai, Mitsuru Kondo, Hideaki Sakurai, Shingo Kanamitsu
Proceedings Volume 11908, 119080D (2021) https://doi.org/10.1117/12.2603907
KEYWORDS: Forward error correction, Critical dimension metrology, Nanoimprint lithography, Double patterning technology, Lithography, Scanning electron microscopy, Nanolithography, Image processing, Semiconducting wafers, Etching
Proceedings Article | 26 October 2020 Presentation + Paper
Resist pattern inspection for defect reduction in sub-15 nm templates
Proceedings Volume 11518, 115180H (2020) https://doi.org/10.1117/12.2572389
KEYWORDS: Inspection, Defect inspection, Scanning electron microscopy, Double patterning technology, Nanoimprint lithography, High volume manufacturing, Electron microscopes, Scatterometry, Microscopes, Coherence imaging
Proceedings Article | 29 January 2020 Paper
Template development for sub15nm nanoimprint lithography
Ryota Seki, Akihiko Ando, Takeharu Motokawa, Machiko Suenaga, Noriko Iida nee Sakurai, Ryu Komatsu, Masato Naka, Rikiya Taniguchi, Syuichi Taniguchi, Kazuki Hagihara, Masato Saito, Hideaki Sakurai, Ryoji Yoshikawa, Eiji Yamanaka, Shingo Kanamitsu
Proceedings Volume 11178, 111780S (2020) https://doi.org/10.1117/12.2567043
KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Inspection, Scanning electron microscopy, Optical lithography, Etching, Lithography, Double patterning technology, Quartz
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