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Robert Seidel
at Intel Corp
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Publications (4)
Proceedings Article | 10 April 2024 Presentation
DSA materials and processes development for ≤ P24 EUV resist L/S pattern rectification
Eungnak Han, Gurpreet Singh, Tayseer Mahdi, Robert Seidel, Sandra Murcia, Lauren Doyle, Nityan Nair, Nafees Kabir, Sean Pursel, David Shykind, Todd Hoppe, Florian Gstrein
Proceedings Volume PC12956, PC129560P (2024) https://doi.org/10.1117/12.3012612
KEYWORDS: Directed self assembly, Extreme ultraviolet, Materials processing, Extreme ultraviolet lithography, Block copolymers, Surface roughness, Scanners, Optical lithography, Objectives, Fabrication
Proceedings Article | 6 April 2015 Paper
The effects of geometry and chemistry of nanopatterned substrates on the directed self-assembly of block-copolymer melts
Grant Garner, Lance Williamson, Robert Seidel, Paulina Rincon Delgadillo, Su-Mi Hur, Roel Gronheid, Paul Nealey, Juan de Pablo
Proceedings Volume 9423, 94231K (2015) https://doi.org/10.1117/12.2085987
KEYWORDS: Polymers, Molecular self-assembly, Monte Carlo methods, Chemistry, Nanostructures, Computer simulations, Thermodynamics, Scanning electron microscopy, Optical lithography, Directed self assembly
Proceedings Article | 20 March 2015 Paper
The role of guide stripe chemistry in block copolymer directed self-assembly
Robert Seidel, Lance Williamson, YoungJun Her, Jihoon Kim, Guanyang Lin, Paul Nealey, Roel Gronheid
Proceedings Volume 9425, 94250W (2015) https://doi.org/10.1117/12.2085905
KEYWORDS: Chemistry, Tolerancing, Lithography, Semiconducting wafers, Line edge roughness, Thin films, Plasma etching, Etching, Polymethylmethacrylate, Directed self assembly
Proceedings Article | 27 March 2014 Paper
Investigation of cross-linking poly(methyl methacrylate) as a guiding material in block copolymer directed self-assembly
Robert Seidel, Paulina Rincon Delgadillo, Abelardo Ramirez-Hernandez, Hengpeng Wu, Youngjun Her, Jian Yin, Paul Nealey, Juan de Pablo, Roel Gronheid
Proceedings Volume 9051, 90510K (2014) https://doi.org/10.1117/12.2048179
KEYWORDS: Polymethylmethacrylate, Picosecond phenomena, Etching, Scanning electron microscopy, Chemistry, Ions, Photoresist materials, Lithography, Neodymium, Directed self assembly
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