Robert Boone
Manager, Machine Learning at ASML
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 23 March 2020 Presentation + Paper
Changsoo Kim, Seungjong Lee, Sangwoo Park, No-Young Chung, Jungmin Kim, Narae Bang, Sanghwa Lee, SooRyong Lee, Robert Boone, Pengcheng Li, Jiyoon Chang, Xinxin Zhou, YoungMi Kim, MinSu Oh, Minsung Kim, Rachit Gupta, Jun Ye, Stanislas Baron
Proceedings Volume 11323, 1132317 (2020) https://doi.org/10.1117/12.2551841
KEYWORDS: Data modeling, Optical proximity correction, Performance modeling, Neural networks, Image processing, Machine learning, Lithography, Extreme ultraviolet, Photoresist processing, Statistical modeling

Proceedings Article | 14 March 2006 Paper
Proceedings Volume 6156, 61560R (2006) https://doi.org/10.1117/12.658823
KEYWORDS: Resolution enhancement technologies, Optical proximity correction, Process modeling, Error analysis, Image processing, Semiconducting wafers, Reticles, Optical lithography, Photomasks, Model-based design

Proceedings Article | 5 November 2005 Paper
Proceedings Volume 5992, 59920R (2005) https://doi.org/10.1117/12.632561
KEYWORDS: Etching, Optical lithography, Photomasks, Quartz, Phase shifts, Printing, Electroluminescence, Manufacturing, Chromium, Optical proximity correction

Proceedings Article | 5 May 2005 Paper
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.601105
KEYWORDS: Model-based design, Optical proximity correction, Optical lithography, Data modeling, Lithography, Systems modeling, Semiconductors, Resolution enhancement technologies, Reticles, Semiconducting wafers

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568682
KEYWORDS: Resolution enhancement technologies, Error analysis, Data modeling, Statistical modeling, Statistical analysis, Databases, Semiconductors, Optical proximity correction, Photomasks, Product engineering

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535279
KEYWORDS: Optical proximity correction, Optical lithography, Lithography

Proceedings Article | 3 May 2004 Paper
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.537655
KEYWORDS: Reticles, Optical proximity correction, Design for manufacturing, Lithography, Logic, Model-based design, Metals, Manufacturing, Optical lithography, Yield improvement

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518271
KEYWORDS: Digital signal processing, Databases, Product engineering, Computer programming, Semiconductors, Photomasks, Photomask technology, Computer programming languages, Data storage

Proceedings Article | 2 July 2003 Paper
Robert Boone, Kevin Lucas, Raphael Wynd, Mike Boatright, Matthew Thompson, Alfred Reich
Proceedings Volume 5043, (2003) https://doi.org/10.1117/12.485281
KEYWORDS: Resolution enhancement technologies, Software development, Lithography, Software engineering, Optical proximity correction, Photomasks, Semiconducting wafers, Computer architecture, Phase shifts, Reticles

Proceedings Article | 11 March 2002 Paper
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458289
KEYWORDS: Resolution enhancement technologies, Photomasks, Optical proximity correction, Data modeling, Electronic design automation, Data conversion, Semiconducting wafers, Model-based design, Data processing, Binary data

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top