Mr. Rakesh Kumar Profile

Rakesh Kumar

at Nanyang Technological Univ

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 3 May 2004 Paper

Patterning sub-50-nm Fin-FET using KrF lithography tool

Navab Singh, S. Jagar, Sohan Mehta, Moitreyee Mukherjee Roy, Rakesh Kumar, N. Balasubramanian

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.536040

KEYWORDS: Directed energy weapons, Optical lithography, Photomasks, Lithography, Field effect transistors, Semiconducting wafers, Electron beam lithography, Reticles, Scanning electron microscopy, Scanners

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Proceedings Article | 26 June 2003 Paper

Impact of scattering bars in damascene trench patterning

Sohan Mehta, Navab Singh, Moitreyee Mukherjee-Roy, Rakesh Kumar

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485377

KEYWORDS: Scattering, Critical dimension metrology, Binary data, Optical lithography, Photomasks, Reticles, Semiconducting wafers, Phase shifts, Modulation, Diffraction

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Proceedings Article | 13 November 2002 Paper

Modification of photoresist profile in lift-off process for MEMS application

Ranganathan Nagarajan, Rakesh Kumar

Proceedings Volume 4936, (2002) https://doi.org/10.1117/12.476090

KEYWORDS: Photoresist processing, Etching, Plasma etching, Metals, Photoresist materials, Ions, Plasma, Reactive ion etching, Microelectromechanical systems, Gold

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Proceedings Article | 24 July 2002 Paper

Effect of developer surfactant on lithography process latitudes and post pattern defect concentration

Moitreyee Mukherjee-Roy, Ngooi Wei, Rakesh Kumar, Satoshi Kawada

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474270

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Lithography, Defect inspection, Microelectronics, Optical lithography, Head-mounted displays, Scanning electron microscopy, Photoresist processing, Manufacturing

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Proceedings Article | 14 September 2001 Paper

Effect of hole shape error on lithography process window

Rakesh Kumar, Moitreyee Mukherjee-Roy, Cher-Huan Tan

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435672

KEYWORDS: Lithography, Optical lithography, Semiconducting wafers, Critical dimension metrology, Lithographic illumination, Image quality, Photomasks, Microelectronics, Roads, Metrology

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Proceedings Article | 24 August 2001 Paper

Organic BARC process evaluation for via first dual-damascene patterning

Cher-Huan Tan, Moitreyee Mukherjee-Roy, Woo-Min Jo, Rakesh Kumar, Pang Dow Foo, Santhanesh Sathappan, Siew Ngooi

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436913

KEYWORDS: Etching, Coating, Optical lithography, Photoresist processing, Lithography, Scanning electron microscopy, Semiconducting wafers, Reflectivity, Inspection, Thin films

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Proceedings Article | 22 August 2001 Paper

Evaluation of overlay measurement target designs for Cu dual-damascene process

Moitreyee Mukherjee-Roy, Rakesh Kumar, Ganesh Samudra

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436732

KEYWORDS: Metals, Dielectrics, Copper, Oxides, Etching, Optical alignment, Photomasks, Overlay metrology, Reticles, Semiconducting wafers

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Showing 5 of 7 publications

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