Dr. Rainer Leuschner Profile

Dr. Rainer Leuschner

at Infineon Technologies AG

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 26 March 2008 Paper

Wafer warp caused by thick film resists acting as a permanent part of the device

R. Leuschner, M. Franosch, T. Dow

Proceedings Volume 6923, 69233N (2008) https://doi.org/10.1117/12.772530

KEYWORDS: Semiconducting wafers, Coating, Polymers, Glasses, Optical alignment, Wafer manufacturing, Optical lithography, Temperature metrology, Epoxies, Silver

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Proceedings Article | 1 June 1991 Paper

Application aspects of the Si-CARL bilayer process

Michael Sebald, Joerg Berthold, Michael Beyer, Rainer Leuschner, Christoph Noelscher, Ulrich Scheler, Recai Sezi, Hellmut Ahne, Siegfried Birkle

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46374

KEYWORDS: Polymers, Semiconducting wafers, Deep ultraviolet, Photoresist processing, Etching, Lithography, Silicon, Plasma, Picture Archiving and Communication System, Oxygen

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Proceedings Article | 1 June 1990 Paper

Chemical amplification of resist lines: a novel sub-half-micron bilayer resist tehnique for NUV and deep-UV lithography

Michael Sebald, Rainer Leuschner, Recai Sezi, Hellmut Ahne, Siegfried Birkle

Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20106

KEYWORDS: Polymers, Silicon, Excimer lasers, Deep ultraviolet, Standards development, Lithography, Etching, Semiconducting wafers, Picture Archiving and Communication System, Ultraviolet radiation

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Proceedings Article | 1 June 1990 Paper

Benefits and prospects of aqueous silylation for novel dry developable high-resolution resists

Recai Sezi, Michael Sebald, Rainer Leuschner, Hellmut Ahne, Siegfried Birkle, Horst Borndoerfer

Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20092

KEYWORDS: Picture Archiving and Communication System, Fourier transforms, Absorbance, Etching, Deep ultraviolet, Reactive ion etching, Lithography, Printing, Manganese, Molecules

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