Prof. Rahul Shukla Profile

Prof. Rahul Shukla

Scientific Officer at Raja Ramanna Ctr for Advanced Technology

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Publications (1)

SPIE Journal Paper | 27 September 2017

Supercritical CO₂ drying of poly(methyl methacrylate) photoresist for deep x-ray lithography: a brief note

Rahul Shukla, Lala Abhinandan, Shivdutt Sharma

JM3, Vol. 16, Issue 03, 034506, (September 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.034506

KEYWORDS: Polymethylmethacrylate, Liquids, Carbon monoxide, Capillaries, X-ray lithography, Photoresist materials, Microfluidics, Carbon dioxide, Microelectromechanical systems, Bioalcohols

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