Dr. Qi Zhang
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 April 2024 Poster
Cameron Adams, Chenyun Yuan, Qi Zhang, Oleg Kostko, Christopher Ober, Rachel Segalman
Proceedings Volume 12957, 1295724 (2024) https://doi.org/10.1117/12.3012454
KEYWORDS: Polymers, Metals, Halogens, Extreme ultraviolet, Chemically amplified resists, Stochastic processes, Photoresist materials, Optical lithography, Line edge roughness, Extreme ultraviolet lithography

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