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Peng Yu
at Univ of Texas at Austin
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 17 October 2008 Paper
Enhanced DCT2-based inverse mask synthesis with initial SRAF insertion
Proceedings Volume 7122, 712241 (2008) https://doi.org/10.1117/12.801409
KEYWORDS: Photomasks, SRAF, Lithography, Optical proximity correction, Semiconducting wafers, Binary data, Resolution enhancement technologies, Mathematical modeling, Berkelium, Manufacturing
SPIE Journal Paper | 1 July 2007
True process variation aware optical proximity correction with variational lithography modeling and model calibration
Peng Yu, Sean Shi, David Pan
JM3, Vol. 6, Issue 03, 031004, (July 2007) https://doi.org/10.1117/12.10.1117/1.2752814
KEYWORDS: Optical proximity correction, Lithography, Photomasks, Calibration, Critical dimension metrology, Photoresist materials, Convolution, Systems modeling, Data modeling, Image processing
Proceedings Article | 28 March 2007 Paper
Fast predictive post-OPC contact/via printability metric and validation
Proceedings Volume 6520, 652045 (2007) https://doi.org/10.1117/12.717194
KEYWORDS: Critical dimension metrology, Optical proximity correction, Lithography, Cesium, Detection and tracking algorithms, Manufacturing, Photoresist materials, Computer simulations, Photomasks, Image processing
Proceedings Article | 14 March 2006 Paper
Fast lithography simulation under focus variations for OPC and layout optimizations
Proceedings Volume 6156, 615618 (2006) https://doi.org/10.1117/12.658110
KEYWORDS: Lithography, Optical proximity correction, Computer simulations, Artificial intelligence, Image analysis, Systems modeling, Critical dimension metrology, Finite element methods, Lithographic illumination, Binary data
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