Mr. Omid T. Ghalehbeygi Profile

Omid T. Ghalehbeygi

at Univ of Newcastle

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Publications (1)

SPIE Journal Paper | 8 September 2017

Gradient-based optimization for efficient exposure planning in maskless lithography

Omid Ghalehbeygi, Adrian Wills, Ben Routley, Andrew Fleming

JM3, Vol. 16, Issue 03, 033507, (September 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033507

KEYWORDS: Photoresist materials, Maskless lithography, Lithography, Convolution, Optimization (mathematics), Photoresist developing, Process modeling, Matrices, Model-based design, Optical simulations

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