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Odo Wunnicke
at Infineon Technologies AG
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Publications (1)
Proceedings Article | 24 July 2002 Paper
Surface properties and topography of 193-nm resist after exposure and development
Odo Wunnicke, Anja Hennig, Karina Grundke, Manfred Stamm, Guenther Czech
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474231
KEYWORDS: Atomic force microscopy, Polymers, Surface properties, Line edge roughness, Surface roughness, Liquids, Interfaces, Scanning electron microscopy, Polymer thin films, Statistical analysis
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