Mr. Naomasa Shiraishi Profile

Naomasa Shiraishi

Assistant Manager at Nikon Corp

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Author

Publications (8)

Proceedings Article | 26 June 2003 Paper

Nikon F2 exposure tool development

Soichi Owa, Yukako Matsumoto, Yasuhiro Ohmura, Shigeru Sakuma, Takashi Aoki, Jin Nishikawa, Hiroyuki Nagasaka, Takeyuki Mizutani, Naomasa Shiraishi, Kazuhiro Kido, Issei Tanaka, Jun Nagatsuka

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485451

KEYWORDS: Pellicles, Projection systems, Photomasks, Lithography, Coating, Birefringence, Crystals, Binary data, Refractive index, Optical design

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Proceedings Article | 30 July 2002 Paper

Innovative optical alignment technique for CMP wafers

Ayako Sugaya, Yuho Kanaya, Shinichi Nakajima, Tadashi Nagayama, Naomasa Shiraishi

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474475

KEYWORDS: Chemical mechanical planarization, Optical alignment, Semiconducting wafers, Algorithm development, Diffraction, Sensors, Reflectivity, Detection and tracking algorithms, Distortion, Reticles

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Proceedings Article | 30 July 2002 Paper

Progress of Nikon's F2-exposure tool development

Naomasa Shiraishi, Soichi Owa, Yasuhiro Ohmura, Takashi Aoki, Yukako Matsumoto, Jin Nishikawa, Issei Tanaka

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474607

KEYWORDS: Birefringence, Crystals, Projection systems, Optical design, Wavefronts, Lithography, Chemical species, Absorption, Combined lens-mirror systems, Calcium

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Proceedings Article | 14 September 2001 Paper

Current status of Nikon's F2 exposure tool development

Naomasa Shiraishi, Soichi Owa, Yasuhiro Ohmura, Takashi Aoki, Yukako Matsumoto, Masato Hatasawa, Takashi Mori, Issei Tanaka

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435631

KEYWORDS: Photomasks, Projection systems, Coating, Combined lens-mirror systems, Oxygen, Lithography, Optics manufacturing, Mirrors, Optical components, Logic devices

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Proceedings Article | 30 December 1999 Paper

Dry and F-doped fused silica for photomask substrate in 157-nm lithography

Hiroki Jinbo, Seishi Fujiwara, Norio Komine, Naomasa Shiraishi, Soichi Owa

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373336

KEYWORDS: Silica, Transmittance, Lithography, Birefringence, Photomasks, Vacuum ultraviolet, Fluorine, Absorption, Scattering, Laser scattering

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Proceedings Article | 7 July 1997 Paper

Alignment strategies for planarizing technologies

Naomasa Shiraishi, Ayako Sugaya, Derek Coon

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276003

KEYWORDS: Sensors, Chemical mechanical planarization, Phase contrast, Microscopes

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Proceedings Article | 17 May 1994 Paper

Innovative image formation: coherency controlled imaging

Koichi Matsumoto, Naomasa Shiraishi, Yuichiro Takeuchi, Shigeru Hirukawa

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175475

KEYWORDS: Photomasks, Imaging systems, Coherence imaging, Polarization, Coherence (optics), Projection systems, Image acquisition, Image quality, Optical lithography, Resolution enhancement technologies

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Proceedings Article | 1 June 1992 Paper

New imaging technique for 64M-DRAM

Naomasa Shiraishi, Shigeru Hirukawa, Yuichiro Takeuchi, Nobutaka Magome

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130364

KEYWORDS: Reticles, Semiconducting wafers, Phase shifts, Wafer-level optics, Image resolution, Optical lithography, Aluminum, Computer simulations, Diffraction, Fourier transforms

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Showing 5 of 8 publications

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