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Mitch Shiver
at Nova Measuring Instruments Inc.
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Publications (1)
Proceedings Article | 13 June 2022 Presentation
In-line XPS metrology using unsupervised machine learning in high volume manufacturing
Paul Isbester, Ganesh Subramanian, Padraig Timoney, Taher Kagalwala, Dmitry Kislitsyn, Heath Pois, Mark Klare, Daniel Kandel, Michal Yachini, Wei Ti Lee, Vanessa Zhang, Mitch Shiver, Saurabh Singh, Parker Lund
Proceedings Volume PC12053, PC120530M (2022) https://doi.org/10.1117/12.2614116
KEYWORDS: Metrology, High volume manufacturing, Machine learning, Manufacturing, X-rays, X-ray characterization, Tolerancing, Semiconductors, Semiconductor manufacturing, Semiconducting wafers
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