The fabrication method of microlens arrays with diameters from 20 to 90 μm based on thermal reflow and dry etch structure transition process is demonstrated. The key process parameters of microlens design and production are obtained by theoretical calculation. And the research of photoresist (AZ4330) surface topography changes during thermal reflow process is studied in detail, which is helpful for microlens array design and process optimization. The photoresist microlens arrays are transferred into quartz by dry etching process. The measurement data indicate that the photoresist microlens arrays have good surface topography and high surface quality, and the optical property of quartz microlens is in good agreement with the theoretical design. This method can be widely used to prepare high quality microlens arrays in optical applications.
A fiber-to-waveguide edge coupler assisted by silicon-nitride subwavelength grating (SWG) structure is proposed on silicon-on-insulator (SOI) platform with large fabrication tolerance. The SWG structure silicon nitride waveguide is designed in the upper layer of the inversed taper silicon waveguide with SWG structure. The two waveguides and cantilever structure work together to reduce the polarization dependent loss (PDL) and improve coupling efficiency. The coupling efficiency of the structure reach up to 98% (0.08dB) when it couples with 10.4 μm SMF-28 fiber. The structure has the advantages of large fabrication tolerance, large alignment tolerance, insensitive polarization and high coupling efficiency etc. The silicon nitride waveguide assisted fiber to waveguide edge coupler is compatible with complementary metal oxide semiconductor (CMOS) process and the fabrication tolerance is also analyzed for future fabrication and measurement.
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