Mr. Michael D. Shumway Profile

Michael D. Shumway

at Intel Corp

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 20 October 2006 Paper

Variable shaped beam writing throughput at the 45nm node and beyond

A. Sowers, M. Shumway, M. Kamna, N. Wilcox, M. Vernon, D. Cole, M. Chandramouli

Proceedings Volume 6349, 63490V (2006) https://doi.org/10.1117/12.686566

KEYWORDS: Vestigial sideband modulation, Beam shaping, Photomasks, Manufacturing, Data modeling, Optical proximity correction, Optical lithography, Model-based design, Manufacturing equipment

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Proceedings Article | 20 May 2004 Paper

EUV resist imaging below 50 nm using coherent spatial filtering techniques

Michael Shumway, Eric Snow, Kenneth Goldberg, Patrick Naulleau, Heidi Cao, Manish Chandhok, James Liddle, Erik Anderson, Jeffrey Bokor

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535666

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Gold, Photomasks, Spatial filters, Line edge roughness, Printing, Wafer-level optics, Extreme ultraviolet lithography, Spatial frequencies

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Proceedings Article | 14 May 2004 Paper

Patterning capabilities of EUV resists

Wang Yueh, Heidi Cao, Manish Chandhok, Sang Lee, Michael Shumway, Jeff Bokor

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536021

KEYWORDS: Line width roughness, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Absorbance, Optical lithography, Lithography, Line edge roughness, Polymers, Manufacturing

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Proceedings Article | 16 June 2003 Paper

Resist evaluation at 50 nm in the EUV using interferometric spatial-frequency-doubled imaging

Michael Shumway, Patrick Naulleau, Kenneth Goldberg, Eric Snow, Jeffrey Bokor

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484677

KEYWORDS: Extreme ultraviolet, Spatial frequencies, Line edge roughness, Interferometry, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Diffraction gratings, Wafer-level optics, Diffraction

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Proceedings Article | 20 August 2001 Paper

Extremely fine-pitch printing with a 10X Schwarzschild optic at extreme-ultraviolet wavelengths

Michael Shumway, Sang Hun Lee, Chang Cho, Patrick Naulleau, Kenneth Goldberg, Jeffrey Bokor

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436690

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Polymethylmethacrylate, Printing, Spatial frequencies, Mirrors, Computer simulations, Objectives, Optical design

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