Mr. Matthew T. Shaw Profile

Matthew T. Shaw

at Intel Ireland Ltd

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 19 March 2015 Paper

The development and advantages of helium ion microscopy for the study of block copolymer nanopatterns

Alan Bell, Ramsankar Senthamaraikannan, Tandra Ghoshal, Atul Chaudhari, Michael Leeson, Mick Morris

Proceedings Volume 9424, 94241R (2015) https://doi.org/10.1117/12.2087494

KEYWORDS: Scanning electron microscopy, Atomic force microscopy, Polymers, Imaging systems, Ions, Picosecond phenomena, Scanning helium ion microscopy, Electrons, Photomasks, Neodymium

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Helium ion microscopy (HIM) has been used to study nanopatterns formed in block copolymer (BCP) thin films. Owing to its’ small spot size, minimal forward scattering of the incident ion and reduced velocity compared to electrons of comparable energy, HIM has considerable advantages and provides pattern information and resolution not attainable with other commercial microscopic techniques.

In order to realize the full potential of BCP nanolithography in producing high density ultra-small features, the dimensions and geometry of these BCP materials will need to be accurately characterized through pattern formation, development and pattern transfer processes. The preferred BCP pattern inspection techniques (to date) are principally atomic force microscopy (AFM) and secondary electron microscopy (SEM) but suffer disadvantages in poor lateral resolution (AFM) and the ability to discriminate individual polymer domains (SEM). SEM suffers from reduced resolution when a more surface sensitive low accelerating voltage is used and low surface signal when a high accelerating voltage is used. In addition to these drawbacks, SEM can require the use of a conductive coating on these insulating materials and this reduces surface detail as well as increasing the dimensions of coated features. AFM is limited by the dimensions of the probe tip and a skewing of lateral dimension results. This can be eliminated through basic geometry for large sparse features, but when dense small features need to be characterized AFM lacks reliability. With this in mind, BCP inspection by HIM can offer greater insight into block ordering, critical dimensions and, critically, line edge roughness (LER) a critical parameter whose measurement is well suited to HIM because of its’ enhanced edge contrast.

In this work we demonstrate the resolution capabilities of HIM using various BCP systems (lamellar and cylinder structures). Imaging of BCP patterns of low molecular weight (MW)/low feature size which challenges the resolution of HIM technique. Further, studies of BCP patterns with domains of similar chemistry will be presented demonstrating the superior chemical contrast compared to SEM. From the data, HIM excels as a BCP inspection tool in four distinct areas. Firstly, HIM offers higher resolution at standard imaging conditions than SEM. Secondly, the signal generated from He⁺ is more surface sensitive and enables visualization of features that cannot be resolved using SEM. Thirdly; superior chemical contrast enables the imaging of un etched samples with almost identical chemical composition. Finally, dimensional measurement accuracy is high and consistent with requirements for advanced lithographic masks.

Proceedings Article | 27 March 2014 Paper

Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process

Atul Chaudhari, Tandra Ghoshal, Matthew Shaw, Cian Cummins, Dipu Borah, Justin Holmes, Michael Morris

Proceedings Volume 9051, 905110 (2014) https://doi.org/10.1117/12.2046044

KEYWORDS: Annealing, Silicon, Oxides, Polymers, Thin films, Iron, Silicon films, Nanostructures, Photomasks, Nanowires

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Proceedings Article | 27 March 2014 Paper

An in-situ hard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrate

Tandra Ghoshal, Ramsankar Senthamaraikannan, Matthew Shaw, Justin Holmes, Michael Morris

Proceedings Volume 9051, 90510J (2014) https://doi.org/10.1117/12.2045754

KEYWORDS: Silicon, Oxides, Iron, Etching, Annealing, Transmission electron microscopy, Polymers, Scanning electron microscopy, Bioalcohols, Nanowires

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SPIE Journal Paper | 1 December 1994

Extreme-ultraviolet studies with laser-produced plasmas

Eugene Kennedy, John Costello, Jean-Paul Mosnier, Attilio Cafolla, Martin Collins, Laurence Kiernan, Ulrich Koeble, Muhammad Sayyad, Matthew Shaw, Bernd Sonntag, Robert Barchewitz

OE, Vol. 33, Issue 12, (December 1994) https://doi.org/10.1117/12.10.1117/12.186393

KEYWORDS: Plasmas, Lithium, Extreme ultraviolet, Photons, Ions, Chemical species, Spectroscopy, Helium, Mirrors, Dye lasers

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