The AIMS® EUV system represents a unique piece of the EUV mask infrastructure for the qualification of the mask printing performance in the aerial image. To meet the industry requirements in the future, ZEISS started the development of a next generation EUV mask review tool, the AIMS® EUV 3.0. The system is based on the best-in-class optical concept proven for the current generation. The tool will support 0.33NA isomorphic and 0.55NA anamorphic imaging from the beginning. In this paper, we will introduce the concept of the AIMS® EUV 3.0 and present the current development status.
The AIMS® EUV system represents a unique piece of the EUV mask infrastructure for the qualification of the mask printing performance in the aerial image. To meet the industry requirements in the future, ZEISS started the development of a next generation EUV mask review tool, the AIMS® EUV 3.0. The system is based on the best-in-class optical concept proven for the current generation. The tool will support 0.33NA isomorphic and 0.55NA anamorphic imaging from the beginning. In this paper, we will introduce the concept of the AIMS® EUV 3.0 and present the current development status.
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