Dr. Malcolm W. McGeoch Profile

Dr. Malcolm W. McGeoch

at PLEX LLC

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Author

Publications (9)

Proceedings Article | 24 March 2017 Paper

Improvement of power, efficiency, and cost of ownership in the tin LPP EUV source

Malcolm McGeoch

Proceedings Volume 10143, 101432K (2017) https://doi.org/10.1117/12.2258670

KEYWORDS: Tin, Argon, Plasma, Extreme ultraviolet, Magnetism, Hydrogen, Ions, Energy efficiency, Particles, Superconductors, Mirrors, Chemical species, Argon ion lasers

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An argon plasma in a magnetic cusp [1,2,3] thermalizes fast tin ions from the laser-plasma exhaust and guides their heat onto a large area beam dump. Demonstrations of plasma stability and particle control [2,3] have shown the magnetic field requirement to be modest and easily achievable with a very compact magnetic circuit. The plasma required for an extreme ultraviolet (EUV) source power of 500W has a pressure of 640Pa and is contained in a cusp magnetic well with a containment B field of only 40mT. Superconducting magnets are not required and the conventional magnet power totals only 4kW. A cusp magnetic circuit of mild steel serves as part of the source chamber wall and has very small fringing fields. In 2015 [2] stable containment was demonstrated of an argon plasma at the exhaust power, temperature and density required for this application. Without B-field containment the same degree of tin ion control would require a large gas number density, necessitating the use of hydrogen for low EUV absorption, with its associated disadvantages of dissociation, tin hydride chemistry and re-cycling concerns. Without a guide B-field, the hydrogen throughput to carry away excess plasma heat is very large and the hydrogen flow is not directional, in contrast to the flow of a magnetically-controlled plasma, making scaling of the hydrogen technology very difficult. Substantially raised EUV source efficiency (40% improvement) is achievable via plasma guidance that conforms the shape of the cusp magnetic well to the EUV collector optic, allowing a collection solid angle as high as 7 sterad. This translates into a laser power as low as 30kW for 500W of EUV power. Because the plasma braking mechanism for fast tin ions is dominantly via electron Coulomb collisions [3], non-reactive argon gas can replace hydrogen as the plasma positive ion, and its flow rate can be much lower. In the argon cusp tin LPP source, the exhaust power is guided precisely onto a ring-shaped beam dump that receives argon ions of energy too low to cause back-sputtering of tin. A typical beam dump heat loading for a 500W EUV source will be 100W cm^-2 or less. This combination of low-stress components, easy argon recycling and high source efficiency makes the further development of this technology very important for high volume manufacturing.

Proceedings Article | 18 March 2016 Paper

Tin LPP plasma control in the argon cusp source

Malcolm McGeoch

Proceedings Volume 9776, 97760S (2016) https://doi.org/10.1117/12.2222299

KEYWORDS: Plasma, Argon, Ions, Tin, Extreme ultraviolet, Magnetism, Hydrogen, Sensors, Chemical species, Tellurium

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Proceedings Article | 19 March 2015 Paper

Test of an argon cusp plasma for tin LPP power scaling

Malcolm McGeoch

Proceedings Volume 9422, 942228 (2015) https://doi.org/10.1117/12.2085925

KEYWORDS: Plasma, Argon, Tin, Extreme ultraviolet, Magnetism, Chemical species, Ions, Plasma generation, Hydrogen, Chemical oxygen iodine lasers

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Proceedings Article | 6 May 2005 Paper

Maskless EUV lithography via optically addressed modulator

Malcolm McGeoch

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600008

KEYWORDS: Modulators, Extreme ultraviolet, Mirrors, Deep ultraviolet, EUV optics, Lithography, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Wafer-level optics

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Proceedings Article | 6 May 2005 Paper

Plasma pinch EUV source with particle injection

Malcolm McGeoch

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599980

KEYWORDS: Plasma, Tin, Particles, Extreme ultraviolet, Atmospheric particles, Ions, Heat flux, Argon, Xenon, Stars

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Proceedings Article | 16 June 2003 Paper

Star pinch scalable EUV source

Malcolm McGeoch, Charles Pike

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484932

KEYWORDS: Plasma, Stars, Xenon, Extreme ultraviolet, Ions, Modulators, Electrodes, Sputter deposition, Magnetism, Diodes

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Proceedings Article | 21 July 2000 Paper

Power scaling of a Z-pinch extreme ultraviolet source

Malcolm McGeoch

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390043

KEYWORDS: Extreme ultraviolet, Mirrors, Xenon, Spectroscopy, Solids, Electrodes, Modulators, Plasma, Absorption, Lithography

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Proceedings Article | 25 June 1999 Paper

High-power extreme ultraviolet source based on a Z-pinch

Malcolm McGeoch

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351154

KEYWORDS: Extreme ultraviolet, Xenon, Mirrors, Solids, Electrodes, Ceramics, Spectroscopy, Energy efficiency, Switches, Plasma

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Proceedings Article | 6 June 1993 Paper

Efficient generation at 4.8 um by doubling of mode-locked CO2 laser radiation

Malcolm McGeoch

Proceedings Volume 1871, (1993) https://doi.org/10.1117/12.145205

KEYWORDS: Crystals, Silver selenogallate, Mode locking, Carbon dioxide lasers, Modulation, Laser crystals, Coating, Pulsed laser operation, Absorption, Refractive index

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Showing 5 of 9 publications

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