Prof. Khalil I. Arshak Profile

Prof. Khalil I. Arshak

Director at Univ of Limerick

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Author

Publications (20)

Proceedings Article | 12 May 2009 Paper

Nanopatterning of micro sensor arrays for pH monitoring

O. Korostynska, K. Arshak, A. Arshak, E. Gill

Proceedings Volume 7318, 731810 (2009) https://doi.org/10.1117/12.818353

KEYWORDS: Sensors, Polymers, Electrodes, Polymeric sensors, Nanostructures, Pattern recognition, Microfluidics, Liquids, Head, Resistance

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Proceedings Article | 28 April 2009 Paper

Conducting polymer based DNA biosensor for the detection of the Bacillus cereus group species

Vijayalakshmi Velusamy, Khalil Arshak, Olga Korostynska, Kamila Oliwa, Catherine Adley

Proceedings Volume 7315, 731504 (2009) https://doi.org/10.1117/12.818631

KEYWORDS: Biosensors, Polymers, Electrodes, Pathogens, Gold, Electrons, Target detection, Adsorption, Signal detection, Liquids

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Proceedings Article | 22 May 2007 Paper

A mathematical model for localization and tracking of telemetry capsules using RSSI signals

Khalil Arshak, Francis Adepoju

Proceedings Volume 6592, 65920B (2007) https://doi.org/10.1117/12.721299

KEYWORDS: Receivers, Mathematical modeling, Transmitters, Signal processing, Detection and tracking algorithms, Radio propagation, Non-line-of-sight propagation, Algorithm development, Received signal strength, Transceivers

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Proceedings Article | 15 May 2007 Paper

Mixed metal oxide films as pH sensing materials

Khalil Arshak, Edric Gill, Olga Korostynska, Arousian Arshak

Proceedings Volume 6589, 658919 (2007) https://doi.org/10.1117/12.721950

KEYWORDS: Oxides, Sensors, Metals, Bismuth, Niobium, Capacitance, Semiconductors, Electrodes, Field effect transistors, Titanium

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Proceedings Article | 15 May 2007 Paper

Gamma radiation and ozone sensing properties of In₂O₃:ZnO:SnO₂ thin films

K. Arshak, O. Korostynska, G. Hickey

Proceedings Volume 6589, 658916 (2007) https://doi.org/10.1117/12.721839

KEYWORDS: Ozone, Thin films, Sensors, Electrodes, Gamma radiation, Oxides, Absorbance, Radiation effects, Crystals, Absorption

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Proceedings Article | 20 January 2004 Paper

Thin films of In2O3/SiO as optical gamma radiation sensors

Khalil Arshak, Olga Korostynska, John Henry

Proceedings Volume 5198, (2004) https://doi.org/10.1117/12.505238

KEYWORDS: Thin films, Sensors, Absorption, Absorbance, Gamma radiation, Oxides, Optical properties, Oxygen, Crystals, Scanning electron microscopy

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Proceedings Article | 15 October 2003 Paper

Two-step modified NERIME process using combined focused ion beam lithography and plasma etching

Khalil Arshak, Miroslav Mihov, Arous Arshak, Declan McDonagh, David Sutton, Simon Newcomb

Proceedings Volume 5220, (2003) https://doi.org/10.1117/12.503510

KEYWORDS: Image processing, Gallium, Photoresist processing, Lithography, Oxygen, Ions, Ion beams, Dry etching, Etching, Reactive ion etching

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Proceedings Article | 27 August 2003 Paper

Analysis techniques for investigation of photoresist silylation processes

Thomas Kinsella, Arousian Arshak, Declan McDonagh, Miroslav Mihov, Khalil Arshak, John Fitzgerald

Proceedings Volume 4876, (2003) https://doi.org/10.1117/12.463775

KEYWORDS: Photoresist materials, Photoresist developing, Silicon, Lanthanum, Statistical analysis, Scanning electron microscopy, Standards development, Optical microscopes, Image enhancement, Oxygen

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Proceedings Article | 27 August 2003 Paper

Liquid-phase silylation characterization of Shipley SPR500A-series resists using PRIME top-surface imaging process

Khalil Arshak, Miroslav Mihov, Arousian Arshak, Declan McDonagh, David Sutton, Simon Newcomb, Thomas Kinsella

Proceedings Volume 4876, (2003) https://doi.org/10.1117/12.463645

KEYWORDS: Silicon, Photoresist processing, Scanning electron microscopy, Image processing, Ultraviolet radiation, Absorbance, FT-IR spectroscopy, Spectroscopy, Transmission electron microscopy, Diffusion

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Proceedings Article | 12 June 2003 Paper

Negative resist image by dry etching as a novel top surface imaging process for ion-beam lithography

Khalil Arshak, Miroslav Mihov, Arousian Arshak, Declan McDonagh, David Sutton, Simon Newcomb

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485073

KEYWORDS: Gallium, Image processing, Photoresist processing, Ion beams, Lithography, Dry etching, Ions, Oxygen, Etching, Ion beam lithography

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Proceedings Article | 24 July 2002 Paper

Nanostructure patterns for Shipley SPR505A resist using PRIME process

Khalil Arshak, Miroslav Mihov, Arousian Arshak, Declan McDonagh, Michael Pomeroy, Simon Newcomb

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474177

KEYWORDS: Silicon, Photoresist processing, Ultraviolet radiation, Diffusion, FT-IR spectroscopy, Absorbance, Spectroscopy, Scanning electron microscopy, Lithography, Picture Archiving and Communication System

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Proceedings Article | 8 April 1996 Paper

Characteristics of screen-printed polymer thick films

Khalil Arshak, D. Collins, Declan McDonagh, F. Ansari

Proceedings Volume 2780, (1996) https://doi.org/10.1117/12.238121

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SPIE Journal Paper | 1 January 1996

SLITS simulator: modeling and simulation of e-beam/deep-ultraviolet exposure and silylation

Declan McDonagh, Khalil Arshak, Arousian Arshak, Jules Braddell

OE, Vol. 35, Issue 01, (January 1996) https://doi.org/10.1117/12.10.1117/1.600931

KEYWORDS: Deep ultraviolet, Photoresist processing, Floods, Image processing, Diffusion, Picture Archiving and Communication System, Modeling and simulation, Anisotropy, Semiconducting wafers, Process modeling

Proceedings Article | 9 June 1995 Paper

Modeling and simulation of the PRIME process using the SLITS simulator

Declan McDonagh, Khalil Arshak, Arousian Arshak, Jules Braddell, Bhvanesh Mathur

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210402

KEYWORDS: Floods, Deep ultraviolet, Photoresist processing, Diffusion, Picture Archiving and Communication System, Anisotropy, Semiconducting wafers, Modeling and simulation, Algorithm development, Photomasks

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Proceedings Article | 16 May 1994 Paper

Diffusion enhanced silylation resist (DESIM): a simulator for the DESIRE process

Bhvanesh Mathur, Khalil Arshak, Arousian Arshak, Declan McDonagh

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175364

KEYWORDS: Etching, Photoresist processing, Diffusion, Process modeling, Phase shifts, Photomasks, Dry etching, Silicon, Picture Archiving and Communication System, Mathematical modeling

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Proceedings Article | 15 September 1993 Paper

Modeling of silylated resist profile in DESIRE process

Bhvanesh Mathur, Khalil Arshak, Jules Braddell, D. McDonough, Arousian Arshak

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154801

KEYWORDS: Silicon, Photoresist processing, Diffusion, Photomasks, Etching, Process modeling, Printing, Photoresist materials, Image processing, Modeling

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Proceedings Article | 1 June 1992 Paper

Ester degradation in the DESIRE process

J. O'Neil, Khalil Arshak, Robert Visser

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59737

KEYWORDS: Silicon, Image processing, Spectroscopy, Head-mounted displays, Photoresist processing, Photomasks, FT-IR spectroscopy, Ions, Etching, Photoresist materials

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Proceedings Article | 1 June 1992 Paper

Automated process control for plasma etching

Margaret McGeown, Khalil Arshak, Eamonn Murphy

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59820

KEYWORDS: Process control, Plasma etching, Control systems, Rule based systems, Data processing, Integrated circuits, Inspection, Etching, Metrology, Manufacturing

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Proceedings Article | 1 July 1991 Paper

Process optimization: a case study on the application of Taguchi methods in optical lithography

Khalil Arshak, Eamonn Murphy, Arousian Arshak

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44812

KEYWORDS: Process control, Optical lithography, Signal to noise ratio, Humidity, Failure analysis, Statistical analysis, Semiconducting wafers, Optics manufacturing, Manufacturing, Signal processing

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Proceedings Article | 1 June 1990 Paper

Figure of merit for comparison of misalignment test structures

Nikhil Kundu, Khalil Arshak, Bill Lane, J. Geaney, Shri Gupta

Proceedings Volume 1261, (1990) https://doi.org/10.1117/12.20031

KEYWORDS: Resistors, Precision measurement, Image registration, Semiconducting wafers, Integrated circuits, Inspection, Process control, Metrology, Calibration, Error analysis

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Showing 5 of 20 publications

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