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Ken Furubayashi
at Toshiba Corp
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Publications (1)
Proceedings Article | 15 March 2016 Paper
Mask defect printability in the Self-Aligned Quadruple Patterning (SAQP) process
Ken Furubayashi, Koutarou Sho, Seiro Miyoshi, Shinji Yamaguchi, Kazunori Iida, Satoshi Usui, Tsuyoshi Morisaki, Naoki Sato, Hidefumi Mukai
Proceedings Volume 9780, 97800O (2016) https://doi.org/10.1117/12.2218416
KEYWORDS: Photomasks, Optical lithography, Lithography, Double patterning technology, Scanners, Semiconducting wafers, Reactive ion etching, Metals, Semiconductors, Lenses, Opacity, Etching, Critical dimension metrology, Anisotropic etching, Photoresist materials
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