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Kyungbae Hwang
at KLA Corp
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Publications (1)
Proceedings Article | 18 April 2013 Paper
Study of overlay in EUV/ArF mix and match lithography
Chin-Chou Kevin Huang, Lin Chua, KyungBae Hwang, Antonio Mani, Gino Marcuccilli, Bill Pierson, Ramkumar Karur-Shanmugam, John Robinson, Dongsub Choi, Michael Ferber, Klaus-Dieter Roeth, ByoungHoon Lee, Inhwan Lee
Proceedings Volume 8681, 86811O (2013) https://doi.org/10.1117/12.2011510
KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Overlay metrology, Personal protective equipment, Extreme ultraviolet, Scanners, Lithography, Control systems, Metrology
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