Junming Shao
at Institute of Optics and Electronics CAS
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 5 November 2020 Paper
Zhiwei Li, Junming Shao, Qian Luo, Bin Fan, Baiping Lei, Guohan Gao, Jiang Bian, Shibin Wu, Junfeng Du
Proceedings Volume 11568, 115680Z (2020) https://doi.org/10.1117/12.2579498
KEYWORDS: Photomasks, Photoresist materials, Ions, Surface roughness, Reactive ion etching, Phase measurement, Optical lithography, Optical fabrication

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