Prof. Jun Liu
at Hubei Jiufengshan Lab.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 9 April 2024 Poster + Paper
Shi-Li Xiang, Jun Liu, Lin-Po Hao, Chuan-Yu Shao
Proceedings Volume 12956, 129560P (2024) https://doi.org/10.1117/12.3010606
KEYWORDS: Lithography, Line edge roughness, Resolution enhancement technologies, Critical dimension metrology, Semiconducting wafers, Semiconductors, Edge roughness, Manufacturing, Chemical reactions, Semiconductor manufacturing

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