Dr. John Scanlan
Chief Technologist at Straatum Processware Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 17 May 2005 Paper
Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.606991
KEYWORDS: Sensors, Plasma, Plasma etching, Etching, Signal to noise ratio, Signal processing, Process control, Digital signal processing, Semiconducting wafers, Sensor technology

Proceedings Article | 1 July 2003 Paper
John Scanlan, Kevin O'Leary
Proceedings Volume 5044, (2003) https://doi.org/10.1117/12.485290
KEYWORDS: Process control, Plasma, Semiconducting wafers, Sensors, Data modeling, Library classification systems, Phase modulation, Process modeling, Etching, Statistical modeling

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