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Dr. Jörg Mick
Graduate Engineer at temicon GmbH
SPIE Involvement:
Author
Area of Expertise:
interference lithography , nanostructures , optics , microstructures , seamless large area structuring , processes
Websites:
Company Website
Profile Summary
Expertise in seamless large area micro- and nanostructuring on large areas in photoresists. Additional experience in tooling, e.g. metallic (nickel) tools, PDMS or polyermic molds for replication purposes. Such molds might be used for high volume mass replication processes like UV-roll-to-roll embossing, hot-embossing, injection molding, etc. Besides interference lithography, other tooling technologies like UV-lithography, diamond cutting, e-beam structuring, ... are well known.
Publications (5)
Proceedings Article | 20 February 2017 Paper
Novel seamless origination and tooling approaches for film imprinting technologies
Jörg Mick, Volkmar Boerner, Christoph Stöver, Thomas Ruhl, Philip Mück, Oliver Humbach
Proceedings Volume 10115, 101150U (2017) https://doi.org/10.1117/12.2252831
KEYWORDS: Lithography, Nanostructures, Nanolithography, Light sources and illumination, Life sciences, Nickel, Photoresist materials, Diffusers, Diffraction gratings, Nanostructuring, Control systems, Diffusion, Polymers
Proceedings Article | 6 May 2005 Paper
Maskless origination of microstructures with optical functions on large areas
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598482
KEYWORDS: Photoresist materials, Lithography, Polymers, Silicon, Glasses, Optical components, Lenses, Photomicroscopy, Solar energy systems, Optics manufacturing
SPIE Journal Paper | 1 November 2004
Some application cases and related manufacturing techniques for optically functional microstructures on large areas
Andreas Gombert, Benedikt Bläsi, Chiristopher Bühler, Peter Nitz, Jörg Mick, Wolfgang Hoßfeld, Michael Niggemann
OE, Vol. 43, Issue 11, (November 2004) https://doi.org/10.1117/12.10.1117/1.1803552
KEYWORDS: Antireflective coatings, Photoresist materials, Optics manufacturing, Lithography, Compound parabolic concentrators, Sun, Refractive index, Diffusers, Solar cells, Polymers
Proceedings Article | 8 September 2004 Paper
Large-area origination and replication of microstructures with optical functions
Andreas Gombert, Karen Forberich, Benedikt Blasi, Jorg Mick, Wolfgang HoBfeld, Volker Kubler, Volkmar Boerner
Proceedings Volume 5454, (2004) https://doi.org/10.1117/12.545637
KEYWORDS: Photoresist materials, Lithography, Nickel, Polymers, Ultraviolet radiation, Coating, Photoresist developing, Manufacturing, Optical properties, Transmittance
Proceedings Article | 29 December 2003 Paper
Replicated microstructures with optical functions in solar and display applications
Andreas Gombert, Benedikt Blasi, Christopher Buehler, Peter Nitz, Joerg Mick, Wolfgang Hossfeld, Michael Niggemann
Proceedings Volume 5184, (2003) https://doi.org/10.1117/12.504588
KEYWORDS: Photoresist materials, Antireflective coatings, Compound parabolic concentrators, Sun, Diffusers, Refractive index, Prisms, Polymers, Solar cells, Lithography
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