Jiun-Hau Fu
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2020 Presentation + Paper
Bradley Falch, Linghui Wu, John Tsai, Elsley Tan, Jiunhau Fu, Tengyen Huang, Chuncheng Liao
Proceedings Volume 11328, 113280E (2020) https://doi.org/10.1117/12.2552110
KEYWORDS: Optical proximity correction, Lithography, Photomasks, Associative arrays, Manufacturing, Metals, Semiconductors

Proceedings Article | 23 March 2020 Paper
Jiunhau Fu, Chiang Lin Shih, Chun Cheng Liao, Eric Huang, Elsley Tan, John Tsai, Ming Yun Chen, Yuan Pin Liao, Seung Hee Baek
Proceedings Volume 11323, 113232H (2020) https://doi.org/10.1117/12.2551669
KEYWORDS: Optical proximity correction, Extreme ultraviolet, Molybdenum, Photomasks, Data modeling, Critical dimension metrology, Source mask optimization, Semiconducting wafers, EUV optics, Array processing

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