Ms. Jan Willis Profile

Jan Willis

Executive Advisor at Calibra Consulting

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Author

Publications (11)

Proceedings Article | 26 August 2024 Paper

12th eBeam initiative survey reports semiconductor industry luminaries are confident in high-NA EUV and curvilinear photomasks

Aki Fujimura, Jan Willis

Proceedings Volume 13177, 131770A (2024) https://doi.org/10.1117/12.3031849

KEYWORDS: Extreme ultraviolet, High volume manufacturing, Photomasks, Pellicles, Inspection, Semiconductors, Deep learning, Lithography

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Proceedings Article | 29 September 2023 Paper

11th annual eBeam initiative survey reports EUV fueling photomask growth

Aki Fujimura, Jan Willis

Proceedings Volume 12915, 129150E (2023) https://doi.org/10.1117/12.2683454

KEYWORDS: Extreme ultraviolet, High volume manufacturing, Photomasks, Inspection, Pellicles, Deep learning, Mask making, Industry, Semiconducting wafers, Manufacturing

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Proceedings Article | 16 September 2022 Paper

10th Annual eBeam Initiative Survey Reports Photomask Market Optimism

Aki Fujimura, Jan Willis

Proceedings Volume 12325, 123250G (2022) https://doi.org/10.1117/12.2640370

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Pellicles, Semiconducting wafers, High volume manufacturing, Wafer inspection, Vestigial sideband modulation, Mask making, Manufacturing

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Proceedings Article | 23 August 2021 Paper

eBeam initiative surveys report upbeat photomask market outlook

Aki Fujimura, Jan Willis

Proceedings Volume 11908, 119080C (2021) https://doi.org/10.1117/12.2601110

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Proceedings Article | 6 October 2020 Presentation + Paper

2020 mask maker survey conducted by the eBeam initiative

Aki Fujimura, Jan Willis

Proceedings Volume 11518, 115180E (2020) https://doi.org/10.1117/12.2572811

KEYWORDS: Extreme ultraviolet, Photomask technology, Photomasks

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Proceedings Article | 26 September 2019 Presentation + Paper

2019 Mask makers' survey conducted by the eBeam Initiative

Aki Fujimura, Jan Willis

Proceedings Volume 11148, 1114803 (2019) https://doi.org/10.1117/12.2536769

KEYWORDS: Photomask technology

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Proceedings Article | 9 October 2018 Presentation + Paper

2018 mask makers’ survey conducted by the eBeam Initiative

Aki Fujimura, Jan Willis

Proceedings Volume 10810, 1081002 (2018) https://doi.org/10.1117/12.2506273

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Proceedings Article | 12 June 2018 Paper

eBeam initiative surveys report greatly increased confidence in EUV and mask process correction requirements

Aki Fujimura, Jan Willis

Proceedings Volume 10807, 108070C (2018) https://doi.org/10.1117/12.2323961

KEYWORDS: Photomasks, Extreme ultraviolet

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Proceedings Article | 16 October 2017 Presentation + Paper

2017 mask maker survey conducted by the eBeam Initiative

Aki Fujimura, Jan Willis

Proceedings Volume 10451, 1045103 (2017) https://doi.org/10.1117/12.2280591

KEYWORDS: Photomasks, Extreme ultraviolet, Dry etching, Wet etching

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Proceedings Article | 13 July 2017 Paper

eBeam initiative survey reports confidence in EUV and multi-beam technology

Aki Fujimura, Jan Willis

Proceedings Volume 10454, 104540A (2017) https://doi.org/10.1117/12.2279410

KEYWORDS: Photomasks, Semiconductors, Manufacturing, Ecosystems, Extreme ultraviolet lithography, High volume manufacturing, Mask making, Semiconductor manufacturing, Lithography, Extreme ultraviolet, Nanoimprint lithography

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Proceedings Article | 10 May 2016 Paper

eBeam community speaks out on future directions for photomask manufacturing

Aki Fujimura, Jan Willis

Proceedings Volume 9984, 99840B (2016) https://doi.org/10.1117/12.2239877

KEYWORDS: Photomasks, Manufacturing, Extreme ultraviolet, Nanoimprint lithography, Electron beam lithography, Modulation, Ecosystems, Logic, Semiconductors, Design for manufacturability

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Showing 5 of 11 publications

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