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Ika Oktavia Suryani
at Yonsei University
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Publications (1)
Proceedings Article | 30 April 2023 Presentation
Optimization of dual phase change material mask with sub-diffraction resolution for novel photolithography technology
Shinill Kang, Donghyun Kim, Ika Oktavia Suryani, Eunjoo Chae
Proceedings Volume PC12497, PC124970M (2023) https://doi.org/10.1117/12.2658357
KEYWORDS: Photomasks, Optical lithography, Electron beam lithography, Photoresist materials, Near field optics, Nanolithography, Lithography, Diffraction, Thin films, Near field
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