Mr. Hisanori Sugimachi Profile

Hisanori Sugimachi

Process Engineer at Tokyo Electron Europe Ltd

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Publications (2)

Proceedings Article | 1 April 2009 Paper

CD uniformity improvement for double-patterning lithography (litho-litho-etch) using freezing process

Hisanori Sugimachi, Hitoshi Kosugi, Tsuyoshi Shibata, Junichi Kitano, Koichi Fujiwara, Kouji Itou, Michihiro Mita, Akimasa Soyano, Shiro Kusumoto, Motoyuki Shima, Yoshikazu Yamaguchi

Proceedings Volume 7273, 72731D (2009) https://doi.org/10.1117/12.814033

KEYWORDS: Photoresist processing, Critical dimension metrology, Line width roughness, Lithography, Coating, Double patterning technology, Semiconducting wafers, Factor analysis, Etching, Neodymium

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Proceedings Article | 1 April 2008 Paper

Random 65nm..45nm C/H printing using optimized illumination source and CD sizing by post processing

Jo Finders, Eddy Van der Heijden, Gert-Jan Janssen, Rik Vangheluwe, Tsuysohi Shibata, Ryouichirou Naitou, Hitoshi Kosugi, Hisanori Sugimachi

Proceedings Volume 6924, 69242Y (2008) https://doi.org/10.1117/12.773595

KEYWORDS: Reticles, Optical proximity correction, Printing, Lithographic illumination, Photoresist processing, Critical dimension metrology, Semiconducting wafers, Lithography, Scanning electron microscopy, Double patterning technology

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