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Hawk J. Kim
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Profile Summary
16 years of broad management and customer engagements worldwide in Metrology and Inspection within semiconductor industry.
Publications (1)
Proceedings Article | 5 June 2001 Paper
Advanced defect-detection methods for CMP process modules in semiconductor manufacturing
J. Scott Steckenrider, Rick Foster, Sumit Guha, Younsoo Ra, Hawk Kim, Anantha Sethuraman
Proceedings Volume 4275, (2001) https://doi.org/10.1117/12.429353
KEYWORDS: Chemical mechanical planarization, Semiconducting wafers, Real-time computing, Scanning electron microscopy, Copper, Inspection, Defect detection, Classification systems, Manufacturing, Dielectrics
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