Dr. Hakki Ergun Cekli
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 13 March 2018 Paper
Hakki Ergun Cekli, Jelle Nije, Alexander Ypma, Vahid Bastani, Dag Sonntag, Henk Niesing, Linmiao Zhang, Zakir Ullah, Venky Subramony, Ravin Somasundaram, William Susanto, Masazumi Matsunobu, Jeff Johnson, Cyrus Tabery, Chenxi Lin, Yi Zou
Proceedings Volume 10585, 105851N (2018) https://doi.org/10.1117/12.2297304
KEYWORDS: Pattern recognition, Fingerprint recognition, Semiconducting wafers, Scanners, Metrology, Overlay metrology, Optical lithography, Lithography, Manufacturing, Optical parametric oscillators, Process control, Principal component analysis

Proceedings Article | 8 March 2016 Paper
Kujan Gorhad, Ofir Sharoni, Vladimir Dmitriev, Avi Cohen, Richard van Haren, Christian Roelofs, Hakki Ergun Cekli, Emily Gallagher, Philippe Leray, Dirk Beyer, Thomas Trautzsch, Steffen Steinert
Proceedings Volume 9778, 97783D (2016) https://doi.org/10.1117/12.2219291
KEYWORDS: Semiconducting wafers, Scanners, Reticles, Overlay metrology, Image processing, Process control, Lithography, Yield improvement, Chemical elements, Photomasks, Actuators, Image registration, Metrology, Lithium

Proceedings Article | 23 October 2015 Paper
Richard van Haren, Hakki Ergun Cekli, Jan Beltman, Anne Pastol, Frank Sundermann, Maxime Gatefait
Proceedings Volume 9635, 963507 (2015) https://doi.org/10.1117/12.2197556
KEYWORDS: Metrology, Reticles, Photomasks, Overlay metrology, Scanners, Image registration, Semiconducting wafers, Optical alignment, Data modeling, Pellicles

Proceedings Article | 19 March 2015 Paper
Ofir Sharoni, Vladimir Dmitriev, Erez Graitzer, Yuval Perets, Kujan Gorhad, Richard van Haren, Hakki Cekli, Jan Mulkens
Proceedings Volume 9424, 94241K (2015) https://doi.org/10.1117/12.2085651
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Image registration, Reticles, Overlay metrology, Lithium, Distortion, Metrology, Actuators

Proceedings Article | 29 October 2014 Paper
Richard van Haren, Hakki Ergun Cekli, Xing Lan Liu, Jan Beltman, Anne Pastol, Jean Massin, Emilie Dupre La Tour, Maxime Gatefait, Frank Sundermann
Proceedings Volume 9235, 923522 (2014) https://doi.org/10.1117/12.2069315
KEYWORDS: Reticles, Semiconducting wafers, Scanners, Photomasks, Overlay metrology, Optical alignment, Metals, Image registration, Etching, Metrology

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