Hai D. M. Pham
at Univ of Tokyo
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 March 2008 Paper
Hai Pham Dinh Minh, Tetsuya Iizuka, Makoto Ikeda, Kunihiro Asada
Proceedings Volume 6921, 69211U (2008) https://doi.org/10.1117/12.771091
KEYWORDS: Electron beams, Lithography, Photomasks, Metals, Computer programming, Tolerancing

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