Dr. Francis Fahrni
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12051, 120510K (2022) https://doi.org/10.1117/12.2614031
KEYWORDS: Distortion, Scanners, Overlay metrology, Metrology, Lithography, Interfaces, Spatial frequencies, Semiconducting wafers, Extreme ultraviolet lithography

Proceedings Article | 23 March 2020 Presentation + Paper
Thilo Pollak, Wolfgang Emer, Bernd Thüring, Francis Fahrni, Friso Klinkhamer, Wim de Boeij, Wim Bouman
Proceedings Volume 11327, 113270T (2020) https://doi.org/10.1117/12.2552063
KEYWORDS: Distortion, Spatial frequencies, Semiconducting wafers, Overlay metrology, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Immersion lithography, Lithography

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