As overlay tolerances tighten node-over-node, the measurement and control of overlay has progressed from the low (spatial) frequent domain toward higher spatial frequencies. At present up to 3rd order in the (non-scanning) slit direction can be addressed on high end systems. With the introduction of an advanced distortion-manipulator on an ArFi immersion scanners a significant improvement in the spatial frequency of overlay control can be achieved. This actuator will now enable at least up to 9th order lens distortion manipulation and control in the (non-scanning) slit direction, with future extendibility to on-the-fly adjustments while scanning. The manipulator setup and distortion control is fully incorporated in the scanner software and allows for lens fingerprint optimization, better dynamic lens heating control, and scanner stability control to maintain overlay performance over time. Also an external scanner overlay optimization interface is made available that enables machine-to-machine matching within the immersion platform as well as for cross-matching to the EUV platform. Via this interface also high spatial-frequent process corrections can be send to the scanner. In this paper, we will show the capability of the scanner-integrated distortion manipulator on abovementioned aspects using on-scanner aberration metrology, and in-resist distortion and overlay metrology.
Even with the large-scale adaption of EUV Lithography to High Volume Manufacturing, numerous device-critical product layers will still be exposed with Immersion Lithography Technology and therefore ZEISS and ASML keep investing in the next generation immersion extensions. The overlay accuracy has to be controlled over the exposure field more accurately and also on a higher spatial frequency grid. To support this functionality, a novel manipulator will be incorporated into the next generation of immersion optics, which is especially well-suited for high frequent distortion tuning. Furthermore, lens distortion measurements and adjustments will be done based on more field points. In this paper, we will show the unique correction functionality of this manipulator and show its various application fields for improving the performance of ASML scanners.
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