Mr. David Stein Profile

David Stein

at Univ. Augsburg

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Proceedings Article | 13 March 2024 Presentation + Paper

Non-destructive multi-parameter investigation of nanoimprinted structures

Selina Burkert, Lukas Schwörer, Tim Schubert, David Stein, Andreas Heinrich

Proceedings Volume 12898, 128980M (2024) https://doi.org/10.1117/12.2692650

KEYWORDS: Optical coherence tomography, Nanoimprint lithography, Atomic force microscopy, Two photon polymerization, Manufacturing, 3D metrology, Nondestructive evaluation, Design, Shrinkage, Polymers

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In the field of optics, Nanoimprint Lithography (NIL) is frequently discussed as a cost-effective manufacturing technology for diffractive elements. Using polymer-based NIL structures, it is interesting to quantify their fidelity in the imprinting process. Electron microscopy images are commonly used for measurement purposes. However, there are several other measurement techniques suitable for assessing NIL structures. Each measurement technology has its specific advantages and disadvantages, which can complement the evaluation of NIL structures. Here alternative measurement methods such as white-light interferometry, atomic force microscopy, optical coherent tomography, micro-computed tomography, and environmental scanning electron microscope are investigated to evaluate NIL structures non-destructively and with respect to multiple parameters (e.g. topological, optical). The evaluation criteria include resolution, aspect ratio, and fidelity. Using the discussed measurement technologies makes it possible to choose an appropriate measurement method based on the structure type and research question. Additionally, this enables non-destructive measurement of NIL structures and their continued utilization in the NIL process. Consequently, new insights into the behavior of stamp materials during the imprinting process can be gained and the manufacturing process of diffractive elements can be optimized.

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