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Daniel Lopez
Business Manager at KLA Corp
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Author
Publications (4)
Proceedings Article | 25 May 2010 Paper
EUV mask inspection with 193 nm inspector for 32 and 22 nm HP
Proceedings Volume 7748, 77481Y (2010) https://doi.org/10.1117/12.864093
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Modulation, Lithography, Image enhancement, Reflectivity, Polarization
Proceedings Article | 20 March 2010 Paper
Mask inspection technologies for 22nm HP and beyond
Proceedings Volume 7636, 76360V (2010) https://doi.org/10.1117/12.850766
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Modulation, Lithography, Image enhancement, Reflectivity, Polarization
Proceedings Article | 11 May 2009 Paper
Reticle inspection-based critical dimension uniformity
Venu Vellanki, Carl Hess, Gang Pan, Chunlin Chen, Gregg Inderhees, Daniel Lopez
Proceedings Volume 7379, 73791D (2009) https://doi.org/10.1117/12.824319
KEYWORDS: Reticles, Photomasks, Inspection, Critical dimension metrology, Scanning electron microscopy, Scanners, Semiconducting wafers, Manufacturing, Nanoimprint lithography, Feedback control
Proceedings Article | 24 July 1996 Paper
Investigation of phase-shift mask shifter defect printability and inspection techniques
Yasuhiro Koizumi, Daniel Lopez
Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245241
KEYWORDS: Inspection, Deep ultraviolet, Defect detection, Phase shifts, Reticles, Photomasks, Critical dimension metrology, Defect inspection, Calibration, Silicon films
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