Colin C. Welch
at Oxford Instruments Plasma Technology Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 10 January 2013 Paper
Colin Welch, Deirdre Olynick, Zuwei Liu, Anders Holmberg, Christophe Peroz, Alex P. Robinson, M. David Henry, Axel Scherer, Thomas Mollenhauer, Vince Genova, Doris K. Ng
Proceedings Volume 8700, 870002 (2013) https://doi.org/10.1117/12.2017609
KEYWORDS: Etching, Silicon, Photomasks, Ions, Plasma, Cryogenics, Polymers, Nanoimprint lithography, Silica, Chromium

Proceedings Article | 20 February 2007 Paper
Proceedings Volume 6474, 64740P (2007) https://doi.org/10.1117/12.714048
KEYWORDS: Etching, Zinc oxide, Plasma, Plasma etching, Scanning electron microscopy, Plasma systems, Gases, Ions, Silicon, Photoresist materials

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