Dr. Claudia Fleischmann Profile

Dr. Claudia Fleischmann

at imec

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Author

Publications (3)

SPIE Journal Paper | 25 September 2024

Actinic inspection of the extreme ultraviolet optical parameters of lithographic materials enabled by a table-top, coherent extreme ultraviolet source

Kevin Dorney, Fabian Holzmeier, Nicola Kissoon, Esben Larsen, Dhirendra Singh, Shikhar Arvind, Sayantani Santra, Roberto Fallica, Marina Timmermans, Ivan Pollentier, Igor Makhotkin, Vicky Philipsen, Stefan De Gendt, Claudia Fleischmann, Paul A. van der Heide, John Petersen

JM3, Vol. 23, Issue 04, 041406, (September 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.041406

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Reflectivity, Ruthenium, Pellicles, EUV optics, Reflectometry, Optical properties, Systems modeling

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Proceedings Article | 28 April 2023 Presentation + Paper

Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry

Kevin Dorney, Nicola Kissoon, Fabian Holzmeier, Esben Larsen, Dhirendra Singh, Shikhar Arvind, Sayantani Santra, Roberto Fallica, Igor Makhotkin, Vicky Philipsen, Stefan De Gendt, Claudia Fleischmann, Paul A. van der Heide, John Petersen

Proceedings Volume 12494, 1249407 (2023) https://doi.org/10.1117/12.2658359

KEYWORDS: Extreme ultraviolet, Photoresist materials, Reflectometry, Extreme ultraviolet lithography, Optical constants, Interfaces

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Proceedings Article | 27 April 2023 Presentation + Paper

Small target compatible dimensional and analytical metrology for semiconductor nanostructures using x-ray fluorescence techniques

Philipp Hönicke, Yves Kayser, Victor Soltwisch, Andre Wählisch, Nils Wauschkuhn, Jeroen Scheerder, Claudia Fleischmann, Janusz Bogdanowicz, Anne-Laure Charley, Anabela Veloso, Roger Loo, Hans Mertens, Andriy Hikavyy, Thomas Siefke, Anna Andrle, Grzegorz Gwalt, Frank Siewert, Richard Ciesielski, Burkhard Beckhoff

Proceedings Volume 12496, 124961J (2023) https://doi.org/10.1117/12.2657963

KEYWORDS: Nanostructures, X-ray fluorescence spectroscopy, Metrology, Semiconductors, Fluorescence intensity, Data modeling, Transmission electron microscopy, Small targets

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