Christopher J. Goetz
Development Analyst at Photronics Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 8 December 1995 Paper
Larry Davis, Christopher Goetz, Larry Watson
Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228186
KEYWORDS: Photomasks, Manufacturing, Opacity, Photoresist processing, Image processing, Thin films, Electron beams, Semiconducting wafers, Reticles, Lithography

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