Byoung-Sub Nam
at SK Hynix Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 20 March 2018 Presentation + Paper
Ahmed Seoud, Sherif Hany, Juhwan Kim, Jebum Yoon, Boram Jung, Sang-Jin Oh, Byoung-Sub Nam, Seyoung Oh, Chan-Ha Park
Proceedings Volume 10587, 105870K (2018) https://doi.org/10.1117/12.2297638
KEYWORDS: Optical proximity correction, Lithography, SRAF, Semiconducting wafers, Photomasks, Manufacturing, Computer simulations

Proceedings Article | 13 March 2012 Paper
Mihye Kim, James Moon, Byoung-sub Nam, Se-young Oh, Hyun-jo Yang, Donggyu Yim
Proceedings Volume 8326, 83262C (2012) https://doi.org/10.1117/12.916137
KEYWORDS: Optical proximity correction, Photomasks, Photoresist processing, Process modeling, Semiconductors, Lithography, Optical lithography, Calibration, Source mask optimization, Extreme ultraviolet lithography

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79732N (2011) https://doi.org/10.1117/12.879206
KEYWORDS: Photomasks, Resolution enhancement technologies, Electroluminescence, Optical lithography, Semiconducting wafers, Mask making, Scanning electron microscopy, Lithography, Double patterning technology, Image processing

Proceedings Article | 11 December 2009 Paper
Proceedings Volume 7520, 75200T (2009) https://doi.org/10.1117/12.837136
KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Scanning electron microscopy, Wafer testing, Lithography, Calibration, Point spread functions

Proceedings Article | 20 March 2009 Paper
Proceedings Volume 7271, 727144 (2009) https://doi.org/10.1117/12.814364
KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Photomasks, Scanning electron microscopy, Wafer testing, Silicon, Light scattering

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 71403E (2008) https://doi.org/10.1117/12.804654
KEYWORDS: Optical proximity correction, Critical dimension metrology, Model-based design, Data modeling, Calibration, Semiconducting wafers, Photomasks, Resolution enhancement technologies, Etching, Instrument modeling

Proceedings Article | 19 March 2008 Paper
Byoung-Sub Nam, James Moon, Joo-Hong Jung, Dong-Ho Kong, Se-young Oh, Cheol-Kyun Kim, Byung-Ho Nam, Dong Gyu Yim
Proceedings Volume 6925, 692514 (2008) https://doi.org/10.1117/12.772430
KEYWORDS: Photomasks, Design for manufacturing, Optical proximity correction, Semiconductors, Copper, Semiconducting wafers, Data modeling, Lithographic illumination, Electroluminescence, Optical lithography

Proceedings Article | 7 March 2008 Paper
James Moon, Byoung-Sub Nam, Joo-Hong Jeong, Dong-Ho Kong, Byung-Ho Nam, Dong Gyu Yim
Proceedings Volume 6924, 692436 (2008) https://doi.org/10.1117/12.772492
KEYWORDS: Photomasks, Binary data, Semiconducting wafers, Electroluminescence, Bismuth, Semiconductors, Laser applications, Lithography, Chromium, Scanning electron microscopy

Proceedings Article | 21 March 2007 Paper
Proceedings Volume 6521, 652118 (2007) https://doi.org/10.1117/12.711253
KEYWORDS: Lithography, Design for manufacturing, Optical proximity correction, Printing, Semiconducting wafers, Inspection, Data modeling, Photomasks, Semiconductors, Design for manufacturability

Proceedings Article | 7 June 1996 Paper
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240976
KEYWORDS: Absorption, Photoresist processing, Lithography, Physics, Image enhancement, Chemistry, Radon, Electronics

Proceedings Article | 17 May 1994 Paper
Hye-Keun Oh, Jung-Woung Goo, Sug-Soon Yim, Tak-Hyun Yoon, Seung-Wook Park, Byoung Sub Nam, Hoyoung Kang, Cheol-Hong Kim, Woo-Sung Han
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175421
KEYWORDS: Halftones, Photomasks, Binary data, Lithography, Phase shifting, Lithographic illumination, Computer simulations, Optical lithography, Photoresist processing, X-ray technology

Showing 5 of 11 publications
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