Dr. Burak Baylav Profile

Dr. Burak Baylav

RET Engineer at Intel

SPIE Involvement:

Author

Area of Expertise:

Optical Proximity Correction , Photolithography , Microelectronics , Semiconductors , Semiconductor Manufacturing

Publications (4)

Proceedings Article | 31 March 2014 Paper

Mitigating mask roughness via pupil filtering

B. Baylav, C. Maloney, Z. Levinson, J. Bekaert, A. Vaglio Pret, B. Smith

Proceedings Volume 9052, 90521O (2014) https://doi.org/10.1117/12.2045668

KEYWORDS: Photomasks, Image filtering, Optical filters, Line width roughness, Line edge roughness, Diffraction, Lithography, Extreme ultraviolet, Phase shift keying, Semiconducting wafers

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Proceedings Article | 12 April 2013 Paper

Line edge roughness (LER) mitigation studies specific to interference-like lithography

Burak Baylav, Andrew Estroff, Peng Xie, Bruce Smith

Proceedings Volume 8683, 86831Y (2013) https://doi.org/10.1117/12.2011505

KEYWORDS: Line edge roughness, Photomasks, Nanoimprint lithography, Image filtering, Lithography, Semiconducting wafers, Projection lithography, Critical dimension metrology, Diffraction, Image processing

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Proceedings Article | 5 April 2011 Paper

EUV flare and proximity modeling and model-based correction

Christian Zuniga, Mohamed Habib, James Word, Gian Lorusso, Eric Hendrickx, Burak Baylav, Raghu Chalasani, Michael Lam

Proceedings Volume 7969, 79690T (2011) https://doi.org/10.1117/12.879488

KEYWORDS: Extreme ultraviolet, Optical proximity correction, Data modeling, Model-based design, Photomasks, Point spread functions, Calibration, Extreme ultraviolet lithography, Fractal analysis, 3D modeling

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Proceedings Article | 30 March 2010 Paper

Alternatives to chemical amplification for 193nm lithography

Burak Baylav, Meng Zhao, Ran Yin, Peng Xie, Chris Scholz, Bruce Smith, Thomas Smith, Paul Zimmerman

Proceedings Volume 7639, 763915 (2010) https://doi.org/10.1117/12.846924

KEYWORDS: Polymers, Polymethylmethacrylate, Photoresist materials, Etching, Lithography, Resistance, Absorbance, Deep ultraviolet, Photoresist developing, Scanning electron microscopy

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