ASELSAN, the largest defense company in Türkiye, develops high performance electro-optical systems for various applications. Research and development activities have been carried out on developing HgCdTe (MCT) detectors for long-wavelength infrared (LWIR) and mid-wavelength infrared (MWIR). In this paper, recent results for VGA 15μm pitch MWIR MCT detectors at IDDCA level are presented. P-on-n MCT epilayers are used for FPA fabrication with either mesa or planar pixel structures. Typically, over 99% operability and less than 20mK NETD values are achieved for 15μm pitch 640x512 format MWIR MCT FPAs at IDDCA level (F/4) in a repeatable fashion. Thermal cycle, mechanical shock, vibration and environmental tests (such as storage and operation under hot and cold temperatures) were applied to these MWIR MCT IDDCAs and passed successfully. Besides ongoing efforts on development of FPAs with 15μm pixel pitch, development activities for pixel pitch reduction also initiated recently for MWIR MCT and very promising results are achieved.
As the largest defense company in Turkey, ASELSAN A.S. pioneers the development of high performance electro-optical systems. Starting from 2014, significant progress has been made for the mid-wave infrared (MWIR) HgCdTe detector technology including development of Cadmium Zinc Telluride (CZT) substrate, Mercury Cadmium Telluride (MCT) growth and focal plane array (FPA) fabrication as well as Readout Integrated Circuit (ROIC) design. In this paper, recent process optimization studies on MWIR MCT detector technology are presented. p-on-n MWIR MCT layers with Cadmium (Cd) composition of ~0.3 are used for the FPA fabrication. 640x512/15 µm FPAs, which demonstrate the state-of-the-art performances, have been fabricated. Typically, over 99.0% operability and less than 25 mK Noise Equivalent Temperature Difference (NETD) values are attained with a cut-off wavelength of 5 µm at 77K. Among these remarkable results, major improvements have been recorded in pixel uniformity, reliability and reproducibility by revisiting process steps. As a result, process yield has been considerably increased.
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