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Arjan Gijsbertsen
at ASML Netherlands BV
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Publications (1)
Proceedings Article | 22 January 2018 Presentation + Paper
Reduction and control of intrafield focus variation on 7nm technology
Jennifer Shumway, Nathan Neal, Sheldon Meyers, Jens Reichelt, Young Ki Kim, Justin Hanson, Ferhad Kamalizadeh, Dionysios Petromanolakis, Youri van Dommelen, Robert Bonanni, Arjan Gijsbertsen
Proceedings Volume 10147, 101470B (2018) https://doi.org/10.1117/12.2258391
KEYWORDS: Optical lithography, Current controlled current source, Calibration, Scanners, Reticles, Monochromatic aberrations, Software development, Semiconducting wafers
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