Mr. Alexandre Villaret Profile

Alexandre Villaret

at STMicroelectronics

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Author

Publications (7)

Proceedings Article | 4 September 2015 Paper

Enabling the 14nm node contact patterning using advanced RET solutions

N. Zeggaoui, G. Landie, A. Villaret, V. Farys, E. Yesilada, A. Tritchkov, J. Word

Proceedings Volume 9661, 96610Q (2015) https://doi.org/10.1117/12.2193772

KEYWORDS: Photomasks, Liquid phase epitaxy, Optical proximity correction, Lithography, Resolution enhancement technologies, SRAF, Semiconducting wafers, Optical lithography, Visualization, Manufacturing

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Proceedings Article | 19 March 2015 Paper

Predictability and impact of product layout induced topology on across-field focus control

J.-G. Simiz, T. Hasan, F. Staals, B. Le-Gratiet, P. Gilgenkrantz, A. Villaret, F. Pasqualini, W. Tel, C. Prentice, A. Tishchenko

Proceedings Volume 9424, 94241C (2015) https://doi.org/10.1117/12.2085283

KEYWORDS: Semiconducting wafers, Scanners, Sensors, Data modeling, Finite element methods, Silicon, Wafer-level optics, Convolution, Photomasks, Chemical mechanical planarization

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Proceedings Article | 12 April 2013 Paper

Inverse lithography technique for advanced CMOS nodes

Alexandre Villaret, Alexander Tritchkov, Jorge Entradas, Emek Yesilada

Proceedings Volume 8683, 86830E (2013) https://doi.org/10.1117/12.2010111

KEYWORDS: Optical proximity correction, Photomasks, SRAF, Liquid phase epitaxy, Photovoltaics, Resolution enhancement technologies, Lithography, Bridges, Manufacturing, Printing

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Proceedings Article | 13 March 2012 Paper

RET and DFM techniques for sub 30nm

E. Yesilada, J. Entradas, C. Gardin, J. N. Pena, A. Villaret, V. Farys, C. Beylier, F. Robert, S. Postnikov, A. M. Armeanu, C. Moyroud, F. Chaoui, F. Bernard Granger, O. Toublan

Proceedings Volume 8326, 83262H (2012) https://doi.org/10.1117/12.915825

KEYWORDS: Optical proximity correction, SRAF, Lithography, Resolution enhancement technologies, Design for manufacturing, Photomasks, Computational lithography, Inspection, Manufacturing, Optical lithography

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Proceedings Article | 16 March 2009 Paper

Impact of modelisation pixel size on OPC consistency

Franck Foussadier, Emek Yesilada, Jean-Christophe Le Denmat, Yorick Trouiller, Vincent Farys, Frédéric Robert, Gurwan Kerrien, Christian Gardin, Loic Perraud, Florent Vautrin, Alexandre Villaret, Catherine Martinelli, Jonathan Planchot, Jean Luc Di-Maria, Mazen Saied, Mame Kouna Top

Proceedings Volume 7274, 727416 (2009) https://doi.org/10.1117/12.814047

KEYWORDS: Optical proximity correction, Critical dimension metrology, Computer simulations, Optical simulations, Optical lithography, Current controlled current source, Optical imaging, Databases, Process modeling, Photomasks

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Proceedings Article | 19 May 2008 Paper

Model-based mask verification on critical 45nm logic masks

F. Sundermann, F. Foussadier, T. Takigawa, J. Wiley, A. Vacca, L. Depre, G. Chen, S. Bai, J.-S. Wang, R. Howell, V. Arnoux, K. Hayano, S. Narukawa, S. Kawashima, H. Mohri, N. Hayashi, H. Miyashita, Y. Trouiller, F. Robert, F. Vautrin, G. Kerrien, J. Planchot, C. Martinelli, J. L. Di-Maria, V. Farys, B. Vandewalle, L. Perraud, J. C. Le Denmat, A. Villaret, C. Gardin, E. Yesilada, M. Saied

Proceedings Volume 7028, 70280U (2008) https://doi.org/10.1117/12.793037

KEYWORDS: Photomasks, Semiconducting wafers, Bridges, Scanning electron microscopy, Critical dimension metrology, Process modeling, Optical proximity correction, Reticles, Model-based design, Logic

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Proceedings Article | 12 March 2008 Paper

Study of SRAF placement for contact at 45 nm and 32 nm node

V. Farys, F. Robert, C. Martinelli, Y. Trouiller, F. Sundermann, C. Gardin, J. Planchot, G. Kerrien, F. Vautrin, M. Saied, E. Yesilada, F. Foussadier, A. Villaret, L. Perraud, B. Vandewalle, J. C. Le Denmat, M. K. Top

Proceedings Volume 6924, 69242Z (2008) https://doi.org/10.1117/12.774091

KEYWORDS: SRAF, Optical proximity correction, Lithography, Eye, Photomasks, Immersion lithography, Manufacturing, Logic, Switching, Printing

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Showing 5 of 7 publications

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