Akash Garg
Process Engineer
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 9 April 2011 Paper
J. Coleman, N. Dias, U. Reddy, A. Garg, J. Young, V. Verma, V. Elarde
Proceedings Volume 7822, 78220O (2011) https://doi.org/10.1117/12.888346
KEYWORDS: Quantum wells, Gallium arsenide, Nanolithography, Quantum dots, Electron beam lithography, Silica, Epitaxy, Device simulation, Optoelectronic devices, Nanostructures

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