Wafer-scale fabrication of metal nanoring and nanocrescent arrays from nanoimprinted nanopillar arrays

Congying Fan; Xuelin Wang; Long Liu; Jian Zhang; Yushuang Cui; Peng Zhan; Changsheng Yuan; Haixiong Ge; Zhenlin Wang; Yanfeng Chen

doi:10.1117/1.JMM.16.3.033501

30 June 2017 Wafer-scale fabrication of metal nanoring and nanocrescent arrays from nanoimprinted nanopillar arrays

Congying Fan, Xuelin Wang, Long Liu, Jian Zhang, Yushuang Cui, Peng Zhan, Changsheng Yuan, Haixiong Ge, Zhenlin Wang, Yanfeng Chen

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, Issue 3, 033501 (June 2017). https://doi.org/10.1117/1.JMM.16.3.033501

Abstract

An approach was presented to fabricate wafer-scale nanoring structures based on nanopillar array templates fabricated by nanoimprint lithography. This fabrication method combined UV-curing nanolithography technology, metal deposition, and an etching process, which made it possible to tune the geometric properties of nanorings: height, diameter, and linewidth for various materials, such as Au and Ni. Nanoring arrays showed potential applications in many fields, including memory storage, biosensing, and optical devices. The optical measurement of Au nanorings (d=380 nm) showed its strong transmission resonances at the wavelength of 2.1 μm. A modified version of this fabrication method by depositing Ni in a controlled angle as a sacrificial layer was also utilized to create nanocrescent arrays. This modified method could easily tune the width of crescents through the nickel deposition angles and nanopillar template heights. The large-area gold nanocrescent arrays showed strong polarization-dependent transmission bands. Plasmonic crescent structures were expected to apply in infrared metamaterial and chemical sensing.

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Congying Fan, Xuelin Wang, Long Liu, Jian Zhang, Yushuang Cui, Peng Zhan, Changsheng Yuan, Haixiong Ge, Zhenlin Wang, and Yanfeng Chen "Wafer-scale fabrication of metal nanoring and nanocrescent arrays from nanoimprinted nanopillar arrays," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(3), 033501 (30 June 2017). https://doi.org/10.1117/1.JMM.16.3.033501

Received: 30 April 2017; Accepted: 9 June 2017; Published: 30 June 2017

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