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Curvilinear mask is known to alleviate the mask making restrictions based on shortest distance between two features. In this study we focus on the impact of using curvilinear mask shapes for high NA. We use diffraction-based analysis to explain some of the observations that favors the use of curvilinear shapes as compared to Manhattan shapes. The benefits observed are dose gain, as well as larger defect-based process window.
Parul Dhagat,Sofia Leitao,Sander Blok,Laurens de Winter, andEelco van Setten
"Curvilinear mask embodiment for high NA: an imaging perspective", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC1275013 (22 November 2023); https://doi.org/10.1117/12.2691085
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Parul Dhagat, Sofia Leitao, Sander Blok, Laurens de Winter, Eelco van Setten, "Curvilinear mask embodiment for high NA: an imaging perspective," Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC1275013 (22 November 2023); https://doi.org/10.1117/12.2691085