Dr. Laurens de Winter
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (21)

SPIE Journal Paper | 8 October 2024
JM3, Vol. 24, Issue 01, 011003, (October 2024) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011003
KEYWORDS: Polarization, Reticles, Semiconducting wafers, Light sources and illumination, Interpolation, Computation time, Diffraction, Vibration, Matrices, Device simulation

Proceedings Article | 18 September 2024 Paper
Proceedings Volume 13273, 1327306 (2024) https://doi.org/10.1117/12.3027067
KEYWORDS: Particles, Scanners, Semiconducting wafers, Simulations, Extreme ultraviolet, Tolerancing, Extreme ultraviolet lithography, Printing, Particle contamination, Defect inspection, Mask cleaning, Computational imaging

Proceedings Article | 22 November 2023 Poster
Parul Dhagat, Sofia Leitao, Sander Blok, Laurens de Winter, Eelco van Setten
Proceedings Volume PC12750, PC1275013 (2023) https://doi.org/10.1117/12.2691085
KEYWORDS: Optical proximity correction, Diffraction, Nanoimprint lithography, Manufacturing, Imaging arrays, Image acquisition, Critical dimension metrology, Cadmium, Bias correction

SPIE Journal Paper | 21 April 2022
JM3, Vol. 21, Issue 02, 023801, (April 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.023801
KEYWORDS: Wavefronts, Zernike polynomials, Scanners, Extreme ultraviolet, Spherical lenses, Monochromatic aberrations, Mirrors, Extreme ultraviolet lithography, Lithography, Sensors

Proceedings Article | 18 November 2020 Presentation + Paper
Proceedings Volume 11517, 1151715 (2020) https://doi.org/10.1117/12.2572878
KEYWORDS: Wavefronts, Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Transistors, Multilayers, Mirrors

Proceedings Article | 30 October 2020 Presentation + Paper
Proceedings Volume 11517, 1151713 (2020) https://doi.org/10.1117/12.2573155
KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Imaging systems, Extreme ultraviolet, Optical proximity correction, Image resolution

Proceedings Article | 23 March 2020 Paper
Mark van de Kerkhof, Fei Liu, Marieke Meeuwissen, Xueqing Zhang, Robert de Kruif, Natalia Davydova, Guido Schiffelers, Felix Wählisch, Eelco van Setten, Wouter Varenkamp, Kees Ricken, Laurens de Winter, John McNamara, Muharrem Bayraktar
Proceedings Volume 11323, 1132321 (2020) https://doi.org/10.1117/12.2551021
KEYWORDS: Extreme ultraviolet, Deep ultraviolet, Extreme ultraviolet lithography, Reflectivity, Reticles, Imaging systems, Scanners

Proceedings Article | 30 October 2017 Presentation + Paper
Proceedings Volume 10450, 104500W (2017) https://doi.org/10.1117/12.2280624
KEYWORDS: Extreme ultraviolet lithography, Nanoimprint lithography, Photomasks, Extreme ultraviolet, Reflectivity, Scanners, Mirrors, Semiconducting wafers, Reticles, Imaging systems

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10143, 1014311 (2017) https://doi.org/10.1117/12.2257463
KEYWORDS: SRAF, Extreme ultraviolet lithography, Diffraction, Photomasks, Image enhancement, Logic, Source mask optimization, Critical dimension metrology, Image acquisition, 3D image processing, Lithographic illumination

SPIE Journal Paper | 30 November 2016
JM3, Vol. 15, Issue 04, 043508, (November 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.043508
KEYWORDS: Critical dimension metrology, Lithographic illumination, Extreme ultraviolet lithography, Lithography, Tantalum, Photomasks, Diffraction, Extreme ultraviolet, Line width roughness, Image acquisition

Proceedings Article | 20 October 2016 Paper
Proceedings Volume 10032, 100320A (2016) https://doi.org/10.1117/12.2248743
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithographic illumination, Extreme ultraviolet, Lithography, Tantalum, Diffraction, Image acquisition, Nanoimprint lithography, Line width roughness

Proceedings Article | 19 October 2016 Paper
Proceedings Volume 9985, 99850W (2016) https://doi.org/10.1117/12.2240862
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Source mask optimization, Diffraction, Critical dimension metrology, Photomicroscopy, Artificial intelligence, SRAF, 3D image processing

SPIE Journal Paper | 6 May 2016
Jo Finders, Laurens de Winter, Thorsten Last
JM3, Vol. 15, Issue 02, 021408, (May 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021408
KEYWORDS: Photomasks, Diffraction, Extreme ultraviolet lithography, 3D modeling, Extreme ultraviolet, Lithography, Diffraction gratings, Tantalum, Refractive index, 3D image processing

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 96350K (2015) https://doi.org/10.1117/12.2196800
KEYWORDS: Photomasks, Lithography, Nanoimprint lithography, Nickel, Reticles, Tantalum, Extreme ultraviolet, Surface plasmons, Optical components, Absorption

Proceedings Article | 4 September 2015 Paper
N. Davydova, R. Kottumakulal, J. Hageman, J. McNamara, R. Hoefnagels, V. Vaenkatesan, A. van Dijk, K. Ricken, L. de Winter, R. de Kruif, R. Jonckheere, T. Hollink, G. Schiffelers, E. van Setten, P. Colsters, W. Liebregts, R. Pellens, J. van Dijk
Proceedings Volume 9661, 96610B (2015) https://doi.org/10.1117/12.2195733
KEYWORDS: Aluminum, Deep ultraviolet, Reflectivity, Reticles, Semiconducting wafers, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Coating, Reflection

Proceedings Article | 4 September 2015 Paper
Proceedings Volume 9661, 96610A (2015) https://doi.org/10.1117/12.2195469
KEYWORDS: Tantalum, Diffraction, Nanoimprint lithography, Photomasks, Extreme ultraviolet, 3D modeling, Refractive index, Absorption, Distortion, Apodization

Proceedings Article | 9 July 2015 Paper
Florian Dhalluin, Laurens de Winter, Luigi Scaccabarozzi, Jack Van der Sanden, Sven Lentzen, Rob Van Gils, Maurice Bogers, Erik Ruinemans, Derk Brouns, Juan Diego Arias Espinoza, Mária Péter, Daniel Smith, Wim Van der Zande, Hans Vermeulen
Proceedings Volume 9658, 96580J (2015) https://doi.org/10.1117/12.2197454
KEYWORDS: Pellicles, Reticles, Finite element methods, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Resistance, Semiconducting wafers, Protactinium

Proceedings Article | 17 April 2014 Paper
Carmen Zoldesi, Kursat Bal, Brian Blum, Guus Bock, Derk Brouns, Florian Dhalluin, Nina Dziomkina, Juan Diego Arias Espinoza, Joost de Hoogh, Silvester Houweling, Maarten Jansen, Mohammad Kamali, Alain Kempa, Ronald Kox, Robert de Kruif, Jorge Lima, Yang Liu, Henk Meijer, Hans Meiling, Ijen van Mil, Marco Reijnen, Luigi Scaccabarozzi, Daniel Smith, Beatrijs Verbrugge, Laurens de Winters, Xugang Xiong, John Zimmerman
Proceedings Volume 9048, 90481N (2014) https://doi.org/10.1117/12.2049276
KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Reticles, Prototyping, Silicon, Manufacturing, Particles, Critical dimension metrology, Protactinium

Proceedings Article | 27 March 2007 Paper
Proceedings Volume 6520, 65200D (2007) https://doi.org/10.1117/12.712272
KEYWORDS: Polarization, Photomasks, Lithography, Optical proximity correction, Diffraction, Birefringence, Pellicles, Critical dimension metrology, Optical lithography, Thin films

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 652039 (2007) https://doi.org/10.1117/12.711188
KEYWORDS: Lithography, Lithographic illumination, Fiber optic illuminators, Critical dimension metrology, Immersion lithography, Scanners, Solids, Optical proximity correction, Computer simulations, Device simulation

Proceedings Article | 15 March 2006 Paper
Wim de Boeij, Geert Swinkels, Nicolas Le Masson, Armand Koolen, Henk van Greevenbroek, Michel Klaassen, Mark van de Kerkhof, Koen van Ingen Schenau, Laurens de Winter, Martijn Wehrens, Steve Hansen, Christian Wagner
Proceedings Volume 6154, 61540B (2006) https://doi.org/10.1117/12.659006
KEYWORDS: Polarization, Birefringence, Reticles, Lithography, Lithographic illumination, Imaging systems, Photomasks, Fiber optic illuminators, Electroluminescence, Scanners

Showing 5 of 21 publications
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