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Many efforts for GaN-based VCSEL developments have been pursued so far. One of the most promising reflectors for the VCSELs is a lattice-matched AlInN/GaN DBR. In principle, simple device process after the epitaxial growth and a vertical current injection through a conductive DBR are expected. We proposed two new approaches to obtain high quality conductive AlInN/GaN DBRs, one is an implementation of a high-temperature-grown AlGaN graded layer instead of a low-temperature-grown AlGaInN graded layer, and the other is an introduction of a hydrogen treatment instead of a thermal treatment. Both the approaches are useful to obtain high-quality Si-doped conductive AlInN/GaN DBRs.
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